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November 1, 1992Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Characterization of near-field holography grating masks for optoelectronics fabricated by electron beam lithography

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Authors

DTD. M. TennantUniversity of Tennessee at KnoxvilleTKT. L. KochAT&T (United States)PMP. P. MulgrewAT&T (United States)

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Tennant et al. (1992) studied this question.

synapsesocial.com/papers/6a86baf8fd179ab3599eaebfhttps://doi.org/10.1116/1.586052
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