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May 15, 1991Journal of Applied Physics

Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO2 surfaces

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Authors

LTLaura L. TedderUniversity of Colorado BoulderGLGuangquan LuShenzhen UniversityJCJohn E. CrowellUniversity of California, San Diego

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Tedder et al. (1991) studied this question.

synapsesocial.com/papers/6a86cab136c36f97809eb6aehttps://doi.org/10.1063/1.348932
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