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November 1, 1971IBM Journal of Research and Development

A Diffusion Model for Arsenic in Silicon

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Authors

TCT. L. ChiuTexas Instruments (United States)HGHirendra N. GhoshNational Institute of Science Education and Research

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Cite This Study

Chiu et al. (1971) studied this question.

synapsesocial.com/papers/6a86e9a1bb0787ff27ca0f8bhttps://doi.org/10.1147/rd.156.0472
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