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February 1, 1969Journal of Applied Physics

Electromigration in Thin Al Films

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Authors

IBI. A. BlechPalo Alto Research CenterEMEugene S. MeieranIntel (United States)

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Blech et al. (1969) studied this question.

synapsesocial.com/papers/6a871698385344fed8cb8ecfhttps://doi.org/10.1063/1.1657425
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Also Consider

Synapse has enriched 2 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1SOME OBSERVATIONS ON THE ELECTROMIGRATION IN ALUMINUM FILMS1967 · 54 citations
  2. 2RESISTANCE MONITORING AND EFFECTS OF NONADHESION DURING ELECTROMIGRATION IN ALUMINUM FILMS1968 · 155 citations