The reaction mechanism of electroless metal deposition proceeding selectively on a thin film coated on a glass substrate was investigated by x‐ray diffraction, x‐ray photoelectron spectroscopy, and inductively coupled plasma measurements. The thin film was activated for electroless metal deposition just by immersion in solution adjusted to pH 2.5. In this process, Pd(II) was selectively adsorbed on the thin film while simultaneously the underwent dissolution. The dissolution of thin film easily occurred on the (002) face with polarity. The strongly adsorbed Pd(II) was reduced to Pd(0) by a reducing agent in the electroless plating bath and this served as a catalyst center. As a result, metal layers were obtained selectively on the thin film in the electroless plating bath.
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Yoshiki et al. (1995) studied this question.