ZrO 2 films have been deposited at room temperature using Zr(OC4H9)4 and O2 source gases in a low-pressure electron-cyclotron-resonance-excited plasma reactor. The deposited films were, in general, mixed (amorphous and polycrystalline; monoclinic or tetragonal), the crystallinity depending upon the substrate polarization during deposition and the postdeposition annealing. Infrared vibrational modes of the films have been characterized. In as-deposited films, the dielectric constants were ∼12–18, dependent upon sample bias during deposition, and the refractive indices were ∼1.85–1.92.
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Koltunski et al. (2001) studied this question.
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