Sputtered PZT films for ferroelectric devices

The article reviews the sputter deposition of ferroelectric thin films in the lead zirconate-lead titanate (PZT) family of compositions. Five different sputtering geometries to deposit PZT, lead titanate and lanthanum doped lead titanate either from ceramic or metallic targets are described. In addition to this selection of different sputtering geometries the films can be processed either by the so called “one step” process or by a “two step” process. In the one step process “in-situ” growth of the perovskite phase at elevated substrate temperatures is achieved, whereas in the two step process the film is deposited at moderate temperatures in an amorphous or partly crystalline form and then transformed to the perovskite phase by an additional annealing step. Planar multi target sputtering of PZT and lead titanate is discussed in more detail.