Authors
A new x-ray lithographic technique using no thin-film pattern masks is presented. A pattern image is projected by utilizing the total reflection of the x ray from a pattern plate, in which a pattern picture is drawn on a thick and hard substrate. The projected image is geometrically demagnified by the sine of incident angle of the x ray. And we actually succeeded in obtaining the demagnified line and space patterns of 1.9-μm width from the similar patterns of 210 μm by using copper Kα x ray.
Loading...
Matsumura et al. (1984) studied this question.
Synapse has enriched one closely related paper. Consider it for comparative context: