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High-repetition-rate (500 pps) laser action in XeF molecules at 351 and 353 nm in a gas mixture of He, Xe, and NF3 has been demonstrated by use of a blowdown-type fast-flow system and thyratron-switched high-repetition-rate pulse generators. The transverse-flow velocity was 14 m/sec across a discharge region of 1×0.4×30 cm at a pressure of 650 Torr. The electric discharge pulse width was 60 nsec. For single-shot operation, laser output energy of 6 mJ/pulse and electric efficiency of 0.25% have been obtained. For high-repetition-rate operation, the output energy per pulse was only 3 mJ as a result of the long charging time constant.
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C. P. Wang (1978) studied this question.
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