Structural properties of silicon thin films deposited by flow discharge

The polycrystalline and amorphous structure of silicon thin films prepared by glow discharge decomposition of silane have been investigated as a function of deposition conditions. Samples prepared at different values of temperature, pressure, flow rate and RF power have been studied by X-ray diffractometry. The half-intensity width of the 111 Bragg reflection is clear evidence for the existence of a range of structural organisations going from a true amorphous to a polycrystalline one.