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Plasma is a state of matter consisting of ionized gas. A typical example of the application of plasma is utilizing its response to electromagnetic fields to etch dielectrics in the process of fabricating semiconductors. It is well known that the propagation of electromagnetic waves is attenuated when plasma is introduced in their path. The attenuation characteristics of plasma are affected by the collision frequency and the electron density, which has been deeply investigated both theoretically [1-5] and experimentally
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Lee et al. (2018) studied this question.
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