Plasma polymerizations in five silicon compounds having chemical formula of (CH 3 ) 3 SiXSi(CH 3 ) 3 , X = none, CH 2 , NH, O, and S atoms, were investigated by elemental analysis, infrared spectroscopy, and ESCA. The chemical composition of polymers plasma‐polymerized was influenced by the X groups in (CH 3 ) 3 SiXSi(CH 3 ) 3 . Polymers, when X was S atoms, possessed no sulfur; and X was CH 2 groups polymers rich in carbon and hydrogen atoms were formed. Details in chemical composition were discussed by IR and ESCA. Such differences in chemical composition reflected on gas permeability of the plasma films.
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Inagaki et al. (1985) studied this question.
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