The Curie temperature of nickel films deposited in ultra-high vacuum was determined by measuring Hall voltage, electrical resistance and magnetoresistance of films as functions of temperature. A fall of the Curie temperature was observed as thickness decreases below 300Å. The Curie temperature of films is independent of substrate temperature during deposition. The effects of impurities on the Curie temperature are also discussed.
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Morita et al. (1969) studied this question.
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