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The fabrication of micropatterned TiO2 films on deep UV patterned self-assembled monolayers (SAMs) of phenylsiloxane is described. The patterned SAM was immersed in an acidic, aqueous TiF62- solution to directly deposit crystalline TiO2 (anatase) onto both hydrophobic (masked) and hydrophilic (irradiated) surface regions without the need for postdeposition heat curing. Subsequent sonication selectively removed weakly bound TiO2 present in the hydrophobic regions, resulting in a micropatterned TiO2 thin film.
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Koumoto et al. (1999) studied this question.
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