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May 15, 1986Physical review. B, Condensed matter

Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

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DTD. V. TsuGrand Rapids Community CollegeGLG. LucovskyNorth Carolina State UniversityMMM. J. MantiniNorth Carolina State University

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Tsu et al. (1986) studied this question.

synapsesocial.com/papers/6a8933191fb56efa37d43720https://doi.org/10.1103/physrevb.33.7069
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