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October 1, 1984Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Relation between the RF discharge parameters and plasma etch rates, selectivity, and anisotropy

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CZC. B. ZarowinDanbury Hospital

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C. B. Zarowin (1984) studied this question.

synapsesocial.com/papers/6a89338ef8670bac6e333261https://doi.org/10.1116/1.572466
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