Control of the floating potential is demonstrated experimentally in a high-density reactive plasma without using external DC or RF bias. The difference between the floating potential and the space potential in an electron-beam-excited plasma (EBEP) can be easily controlled in the range of 20–90 V by changing the accelerating voltage of the electron beam or the angle between the electron beam and the probe surface.
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Hamagaki et al. (1994) studied this question.
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