The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency [numerical aperture (NA) /lambda] filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics (2/lambda) . Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. 2x reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to ~3N.A./lambda with a consequent threefold resolution enhancement.
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Chen et al. (1999) studied this question.
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