Answers are grounded in this paper and cite their sources.
The fabrication process of submicrometre parallelogramic-shaped gratings is reported, which involves an image reversal resist process and a novel oblique reactive ion etching (RIE) configuration. A submicrometre parallelogramic grating with 40° blaze angle is fabricated using this method.
No takes yet. Share an insight, caveat, or question.
Li et al. (1994) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: