Influence of Si doping on characteristics of InGaN/GaN multiple quantum wells

We have systematically studied the influence of Si doping on the characteristics of InGaN/GaN multiple quantum wells (MQWs) by means of high-resolution x-ray diffraction (HRXRD), photoluminescence (PL), PL excitation (PLE), and time-resolved PL spectroscopy. The twelve- period MQWs were grown by metalorganic chemical vapor deposition. Si doping in the GaN barriers was varied from 1×1017 to 3×1019 cm−3. Information on the structural quality of the MQWs as a function of Si doping was extracted from the linewidth broadening of the higher-order superlattice satellite peaks measured in HRXRD. The HRXRD measurements indicate that increased Si doping results in better interface properties of the MQWs. PL and PLE measurements show a decrease in the Stokes shift with increasing Si doping concentration. The 10 K radiative recombination lifetime was observed to decrease from ∼30 ns (for n<1×1017 cm−3) to ∼4 ns (for n=3×1019 cm−3) with increasing Si doping concentration. The reduced Stokes shift, the decrease in radiative recombination lifetime, and the increase in the interface quality indicate that Si doping results in a decrease in carrier localization at potential fluctuations in the InGaN active layers.