Answers are grounded in this paper and cite their sources.
Liquid phase epitaxy (LPE) and the properties of high purity GaInAs layers on (100)InP substrates are reported. Low carrier concentration (3.8–5.4×1014 cm-3) and high electron mobility (47000–51000 cm2/V.s at 77 K) were obtained reproducibly. The influence of source Ga-In-As melt baking temperatures on the epitaxial layer purity was investigated. The results of a photoluminescence study and van der Pauw measurements show that acceptor impurities as well as donor impurities can be excluded from the source solution by a suitable heat treatment.
No takes yet. Share an insight, caveat, or question.
Amano et al. (1981) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: