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December 1, 1983Journal of The Electrochemical Society

Leakage‐Current Increase in Amorphous Ta2 O 5 Films Due to Pinhole Growth during Annealing Below 600°C

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Authors

SKShin’ichiro KimuraHitachi (Japan)YNYasushiro NishiokaHiroshima UniversityASAkira ShintaniKajima Corporation (Japan)

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Kimura et al. (1983) studied this question.

synapsesocial.com/papers/6a896a0f851416c68bf7cbb0https://doi.org/10.1149/1.2119599
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