Antiferroelectric Pb(Zr, Nb, Ti)O3 (PZNT) films were deposited via a sol-gel process on Pt(111)/Ti/SiO2/Si, LaNiO3- and La0.5Sr0.5CoO3-buffered Si substrate. The scaling behavior of the energy density W of antiferroelectric films was investigated. The scaling behavior of W against frequency f of PZNT on LaNiO3-buffered Si takes the form of W ∝ f0.08, which differs significantly from that form of W ∝ f−0.14 of PZNT on La0.5Sr0.5CoO3-buffered Si. This indicates that the scaling relations of W vary substantially as bottom electrodes change and might be closely related to the variation of nonuniform strain field and depolarization field within the AFE films.
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Ge et al. (2012) studied this question.
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