Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
September 27, 1999Applied Physics Letters

High dielectric constant Hf–Sn–Ti–O thin films

View Full Paper
Ask AI
Bookmark
Share

Authors

LSL. F. SchneemeyerRutgers, The State University of New JerseyRDR. B. van DoverCornell UniversityRFR. M. FlemingMurray State University

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Schneemeyer et al. (1999) studied this question.

synapsesocial.com/papers/6a8a823e186271ac9933685fhttps://doi.org/10.1063/1.124887
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Dielectric polarizabilities of ions in oxides and fluorides1993 · 2,809 citations
  2. 2Cation Deficiencies in RF Sputtered Gadolinium Iron Garnet Films1969 · 46 citations
  3. 3UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs1991 · 205 citations
  4. 4Microwave Characteristics of (Zr, Sn)TiO 4 and BaO‐PbO‐Nd 2 O 3 ‐TiO 2 Dielectric Resonators1984 · 520 citations
  5. 5Deposition of uniform Zr-Sn-Ti-O films by on-axis reactive sputtering1998 · 33 citations