A complete understanding of the leakage current mechanism in ferroelectric thin film capacitors has remained elusive despite numerous experimental and theoretical studies. This paper does not claim to provide the solution but rather to clarify the issues that are still unresolved and need further attention. We discuss the similarities between observed leakage current curves and those for metal-semiconductor-metal punch-through diodes.
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Dawber et al. (2001) studied this question.
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