Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

We investigated the texture of excimer-laser crystallized Si film. For the first time, Si thin films with more than 96% (100) texture have been produced using excimer-laser crystallization of a-Si on a glass substrate. The (100) textured film has rectangular grains with edges parallel to the (110) direction. Results of scanning electron microscopy (SEM), electron backscatter diffraction patterns (EBSP), X-ray diffraction and transmission electron microscopy (TEM) are presented. The results are interpreted on the basis of Si/SiO 2 interface energy and a new grain-selection model.