Technical review demonstrates nanoimprint lithography performance factors across specialized photoresist materials, highlighting adaptable micro- and nanofabrication routes.
This white paper covers UV and electron-beam nanoimprint lithography through the 3Dresyns NMF photoresist family, including stamp, resist and nano/micro fabrication routes. NIL performance depends on resist viscosity, curing route, demoulding, pattern fidelity, shrinkage, adhesion and stamp compatibility. The NMF family is positioned as a nano/micro fabrication material system.
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Juan Segurola (2026) studied this question.
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