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We propose here a method for probe characterization based on lithography on a photosensitive polymer without film development. We record in near field conditions the light emitted by different kinds of probes in order to distinguish in situ the near field contribution from the far field contribution of the tip. This information, which cannot be deduced from far field diffraction, allows an estimation of the field confinement and of the expected resolution of the microscope.
Davy et al. (1996) studied this question.