Fluorine is found to form an adsorbed film on tungsten stable to temperatures above 2600°K. This causes a low accommodation for the thermal dissociation of fluorine. The adsorption is compared to that of oxygen on tungsten.
No takes yet. Share an insight, caveat, or question.
Metlay et al. (1948) studied this question.
Synapse has enriched 2 closely related papers on similar clinical questions. Consider them for comparative context: