Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

C. Godet; B. Drévillon

doi:10.1116/1.575576

July 1, 1988Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

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Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation C. Godet, B. Drevillon; Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films. Journal of Vacuum Science & Technology A 1 July 1988; 6 (4): 2482–2489. https://doi.org/10.1116/1.575576 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search

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synapsesocial.com/papers/6a8af83beee946ed63e3a886 https://doi.org/10.1116/1.575576

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Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

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Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

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