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The quantum confinement of electrons and holes in low‐dimensional semiconductor structures strongly influences the properties of “quantum wires and dots” and therefore has an important impact on the performance of high‐speed electron and optoelectronic devices. The fabrication of such structures using, for example, molecular beam epitaxy and metal–organic vapor phase epitaxy, their characterization, and their use in heterojunctions, quantum wells, and high electron mobility transistors are reviewed.
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Nötzel et al. (1993) studied this question.
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