Growth of Gallium Nitride Thin Film with the Aid of Polymethyl Methacrylate

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Wurtzite structure gallium nitride (GaN) thin film was grown on a c-plane sapphire (0001) substrate through spin coating method followed by nitridation process. Readily available and cheap gallium (III) nitrate hydrate (Ga(NO 3 ) 3 xH 2 O) powder was used as the gallium source. Besides that, ethanol-based precursor solution which has better wetting properties and fast evaporation rate was prepared. In addition, a thin layer of polymethyl methacrylate was introduced as a bonding adhesive layer for the growth of the GaN thin film. X-ray diffraction results indicated that the deposited film consists of nanocrystallite GaN with hexagonal wurtzite structure. Field-emission scanning electron microscopy showed the morphologies of the small and well-defined spherical grains that coated on the substrate. The synthesized GaN thin film demonstrated a pronounced and broad exciton peak at 380 nm in Photoluminescence spectrum. Raman scattering measurements showed two features that correspond to the E 2 (high) and A 1 (LO) phonon modes of the hexagonal GaN.