A three target dc magnetron sputtering system has been constructed. The main feature of the system is a unique rotating substrate table which permits deposition onto continuously heated or cooled substrates while they are rotating. With this setup, Nb-based tunnel junctions with thin Al overlayers, multilayered materials, and a variety of alloys have been prepared.
No takes yet. Share an insight, caveat, or question.
Huggins et al. (1983) studied this question.