The history of the development of photoresists based on the photostructural transformations in chalcogenide glassy semiconductors is discussed in this paper. The properties of such photoresists including the possibility of an essential increase of their photosensitivity and also applications are examined. Together with the photoresists, the chalcogenide glassy roentgen‐, electron beam‐, and plasma‐resists are briefly considered.
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V. Lyubin (2009) studied this question.
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