Physical modeling of strain-dependent hole mobility in Ge p-channel inversion layers

We present comprehensive calculations of the low-field hole mobility in Ge p-channel inversion layers with SiO2 insulator using a six-band k⋅p band-structure model. The cases of relaxed, biaxially, and uniaxially (both tensily and compressively) strained Ge are studied employing an efficient self-consistent method—making use of a nonuniform spatial mesh and of the Broyden second method—to solve the coupled envelope-wave function k⋅p and Poisson equations. The hole mobility is computed using the Kubo–Greenwood formalism accounting for nonpolar hole-phonon scattering and scattering with interfacial roughness. Different approximations to handle dielectric screening are also investigated. As our main result, we find a large enhancement (up to a factor of 10 with respect to Si) of the mobility in the case of uniaxial compressive stress similarly to the well-known case of Si. Comparison with experimental data shows overall qualitative agreement but with significant deviations due mainly to the unknown morphology of the rough Ge-insulator interface, to additional scattering with surface optical phonon from the high-κ insulator, to Coulomb scattering interface traps or oxide charges—ignored in our calculations—and to different channel structures employed.