Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
July 1, 1981IEEE Transactions on Electron Devices

Modeling and optimization of monolithic polycrystalline silicon resistors

View Full Paper
Ask AI
Bookmark
Share

Authors

NLNicky LuItron (United States)LGL. GerzbergQualcomm (United Kingdom)CLChih‐Yuan LuIntel (United States)

Discussion

Loading...

Member takes

Overview

Key Points

Key points are not available for this paper at this time.

Cite This Study

Lu et al. (1981) studied this question.

synapsesocial.com/papers/6a8b98e90ca85c7e33def9a2https://doi.org/10.1109/t-ed.1981.20437
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1A new conduction model for polycrystalline silicon films1981 · 45 citations
  2. 2Chemical Vapor Deposited Polycrystalline Silicon1972 · 173 citations
  3. 3Dopant segregation in polycrystalline silicon1980 · 371 citations
  4. 4A quantitative model of the effect of grain size on the resistivity of polycrystalline silicon resistors1980 · 94 citations