Thermodynamic analysis reveals temperature-dependent morphology of oxide precipitates in Czochralski silicon, highlighting interfacial Frenkel defect dynamics.
Using thermodynamic and kinetic considerations, we explain the quasiequilibrium, morphological, and structural characteristics of thermally induced oxide precipitates in Czochralski silicon. A model based upon the formation of Frenkel defects at the silicon/silica interface is used to explain the experimentally observed precipitate shapes: 〈110〉 coesite rods, (100) vitreous silica discs, and silica polyhedra at low, intermediate, and high temperatures, respectively.
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Tiller et al. (1986) studied this question.
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