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A new technique for controlled etching of micrometer-size regions on thin films has been developed. Dopant atoms are deposited on the film surface by UV laser photodissociation of a gas and incorporated by simultaneous heating with a visible laser beam. The process has been demonstrated by laser alloying Al films with Zn to produce localized chemically reactive regions of Zn/Al alloy.
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Ehrlich et al. (1981) studied this question.
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