We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures /spl ges/200/spl deg/C. The sensitivity can be reduced by an anneal in oxygen. Properly annealed modulators operated for 150 h with 400 mW at 1320 nm with no photorefractive effects other than a 3/spl deg/ change in bias point.>
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Betts et al. (1994) studied this question.
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