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A passive micro strain gauge with a mechanical amplifier has been designed, analyzed, and tested. The mechanical amplifier provides a high gain such that residual strain in thin films can be directly measured under an optical microscope. This strain gauge can be in situ fabricated with active micro sensors or actuators for monitoring residual strain effects, and both tensile and compressive residual strains can be measured via the strain gauge. It is shown that a very fine resolution of 0.001% strain readouts can be achieved for a micro strain gauge with a 500 /spl mu/m-long indicator beam. Beam theories have been used to analyze the strain gauge with a mechanical amplifier, and the results were verified by a finite-element analysis. Experimental measurements of both polysilicon and silicon-riched silicon-nitride thin films fabricated by surface micromachining processes are presented.
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Lin et al. (1997) studied this question.
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