Advances in lithography have contributed significantly to the advancement of the integrated circuit technology. While non-optical next-generation lithography (NGL) solutions are being developed, optical lithography continues to be the workhorse for high-throughput very-large-scale integrated (VLSI) lithography. Extending optical lithography to the resolution levels necessary to support today's aggressive product road maps increasingly requires the use of resolution-enhancement techniques. This paper presents an overview of several resolution-enhancement techniques being developed and implemented in IBM for its leading-edge CMOS logic and memory products.
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Liebmann et al. (2001) studied this question.