Patterning of 2–10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope

Ultrathin films of 2–10 nm thickness were deposited by pulsed discharge plasma polymerization. The film surface topography was studied by an atomic force microscope (AFM), which showed that the films are smooth and pinhole-free. The AFM was used to produce nanometer-scale indentations/holes in these deposited ultrathin organic films. The patterning process is governed by several factors: mechanical and Coulomb forces, heat effects, material transfer, and electric charge deposition depending on the conditions. The patterning results indicate the AFM can be used for the formation of nanometer-scale structures.