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June 1, 1978Journal of Applied Physics

The stress-enhanced diffusion of boron in silicon

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Authors

YTYoshihiro TodokoroKyoto Seika UniversityITI. TeramotoOkayama Prefectural University

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Todokoro et al. (1978) studied this question.

synapsesocial.com/papers/6a8f3350bd9e3ccad05ebf53https://doi.org/10.1063/1.325210
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