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April 4, 1988Applied Physics LettersOpen Access

High-rate growth at low temperatures by free-jet molecular flow: Surface-reaction film-formation technology

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TOT. OhmiTohoku UniversityMMMizuho MoritaThe University of OsakaTKTakashi KochiTokyo Electron (Japan)

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Ohmi et al. (1988) studied this question.

synapsesocial.com/papers/6a9019776e8a0e3a17040cd4https://doi.org/10.1063/1.99196
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