Answers are grounded in this paper and cite their sources.
We use X-ray absorption fine structure (XAFS) spectroscopy at the Si K-edge and the Ag L 3,2 -edge to monitor the surface chemistry of silicon nanowires. We found that Si nanowires prepared by laser ablation and thermal evaporation are coated with a thick layer of oxides that can be readily removed with a HF solution. HF-refreshed silicon nanowires become a moderate reducing agent and can be used as a nanostructure template upon which silver nanoaggregate deposited reductively from a Ag + aqueous solution, reoxidizing the surface in the process. These results are compared with those of porous silicon.
No takes yet. Share an insight, caveat, or question.
Sun et al. (2002) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: