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We present results of dark-conductivity, photoconductivity, photoluminescence, and optical-absorption experiments on films of sputtered oxygenated amorphous-silicon-hydrogen alloys (a-Si_1-xHₓ). Films with oxygen (O) are shown to behave much more like glow-discharge-produced a-Si_1-xHₓ than do O-free films. O is found to enter the amorphous matrix predominantly in an Si-O-Si bridging configuration. Defects associated with the presence of H are shown to be likely centers for radiative recombination, while both O and H may be associated with locally deformable defects.
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Paesler et al. (1978) studied this question.
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