We report on the observation of room-temperature single electron tunneling phenomena in a metal-insulator-metal-semiconductor double-junction structure. The nanosized Ag dots were self-assembled on a Sb-terminated Si(100) surface, and the Coulomb gap and staircases were observed in the local current–voltage (I–V) measurements using scanning tunneling microscopy. The I–V characteristics exhibiting the single electron tunneling behavior vary significantly with the variation of the measurement position within the same Ag droplet. These phenomena are well described by the tip-dot(Ag)-Si double-junction picture.
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Park et al. (1997) studied this question.
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