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There exists interest in the measurement of small forces for applications such as microtopography of semiconductor devices and atomic force microscopy. A new method is introduced here in which a small silicon beam, that is acted on by the external force of interest, has its position sensed by an rf phase shift technique. The position information in turn is fed back via electrostatic forces to continuously rebalance the beam about its central support. This force-feedback approach provides high sensitivity, submillisecond response, inherent force calibration, and electronically controlled stiffness.
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Miller et al. (1991) studied this question.
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