Preparation of photoresist polymer by a photoreactive monomer containing N,N‐diethyldithiocarbamate group

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A novel photosensitive monomer with a pendant photoreactive diethyldithiocarbamoyl group, VBDC, was synthesized and copolymerized with some vinyl monomers by AIBN. The copolymers obtained have efficient photocrosslinking abilities, and are thermally stable. Therefore, there was no loss of dithiocarbamoyl group during radical polymerization, and the polymerization proceeded through vinyl group. The degree of photocrosslinking was proportional to the concentration of the photosensitive group, but photosensitivity of the polymer was not. Water‐soluble photoreactive copolymers, VBDC with AAm or MA, were also prepared. AAm copolymer has a good photosensitivity by only 3 mol % VBDC incorporation. Photocrosslinking yields of these polymers depend on the viscosity of original polymers except in the case of low concentration of VBDC. The relation between copolymer composition and glass transition temperature was also investigated. From the investigation of Tg, it was concluded that the copolymer structure largely affected on ΔTg. The mechanism of photocrosslinking was studied by photodecomposition of benzyl N, N‐diethyldithiocarbamate, and the result that the decreases of sulfur content clearly related to photocrosslinking points was also obtained.