The optically active center and its activation process in Er-doped Si thin film produced by laser ablation

The local structure of erbium-doped silicon produced by the laser ablation technique is investigated by Er LIII-edge x-ray absorption fine structure analysis. The combined analysis of extended x-ray absorption fine structure analysis and an x-ray absorption near-edge structure simulation based on multiple-scattering theory reveals the most probable atomic coordination of the optically active center; Er bonded with six oxygen atoms has a C4v symmetry. The optical activation process of this system is also discussed. The Si target with 10 wt% Er2O3 has two kinds of local structures, C-rare-earth Er2O3 grain and another Er phase incorporated in Si. The laser ablation homogenizes these phases, and deposits a new single-phase structure of the octahedron (Oh point group) on the substrates. In this phase, the optical transition probability is low due to the forbidden 4f transition of Er in the crystal field originating from the higher-order symmetry of O. After annealing, degradation of the symmetry from Oh to C4v results in a crystal field suitable for inducing sufficient radiation transition.